Chemicals typically used in prime face polishing of semiconductor wafers or electronic and optoelectronic crystals, such as Bromine Methanol or acid etches, are highly aggressive and require ......

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更新時(shí)間：2025-12-05
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產(chǎn)品詳情

Chemicals typically used in prime face polishing of semiconductor wafers or electronic and optoelectronic crystals, such as Bromine Methanol or acid etches, are highly aggressive and require the use of specialised corrosive resistant equipment.

The CP4000 has been designed exactly for this application, and utilises a chemical etch polishing process to produce high quality results with minimal subsurface damage.

Ø Corrosive Resistant Construction

Ø Workdecks

Ø Polishing Plate

Ø Industry Standard System Architecture

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Chemicals typically used in prime face polishing of semiconductor wafers or electronic and optoelectronic crystals, such as Bromine Methanol or acid etches, are highly aggressive and require ......

Chemicals typically used in prime face polishing of semiconductor wafers or electronic and optoelectronic crystals, such as Bromine Methanol or acid etches, are highly aggressive and require the use of specialised corrosive resistant equipment.

留言框

產(chǎn)品：

您的單位：

您的姓名：

聯(lián)系電話：

常用郵箱：

省份：

詳細(xì)地址：

補(bǔ)充說明：

驗(yàn)證碼：

中文字幕在线播放一区I午夜在线资源I九九久久影院I久久免费看毛片I五月婷婷亚洲I久久久精品国产一区二区I日韩在线观看